In applications related to laser cooling system, Tisarius-D efficiently cools such atoms as Ca (397, 423, 442.7 nm), Mg (383 nm), Pb (368.3 nm), Rb (421 nm), Sr (422, 481 nm), Yb (369.5 nm), Er (401 nm), Tm (410-420 nm) and many others.
In areas connected to physical vapour deposition system Tisarius-D provides precision control in deposition of such materials as aluminium (394 nm), titanium (391 nm), yttrium (408 nm), tungsten (385 nm), gallium (403 nm) and others.